发明名称 Antenna structure and plasma generating device
摘要 An antenna structure includes four induction antennas which have the same structure, are connected in parallel and are disposed to be overlapped. The induction antennas include an external upper section arranged on a first quadrant of a first layer, an internal upper section connected to the external upper section and arranged on a second quadrant of the first layer, an internal lower section connected to the internal upper section and arranged on a third quadrant of a second layer arranged on a lower part of the first layer, and an external lower section connected to the internal lower section and arranged on a fourth quadrant of the second layer. An RF power is supplied to one end of the external upper section, and the other end of the external lower section is grounded.
申请公布号 US9642238(B2) 申请公布日期 2017.05.02
申请号 US201615010440 申请日期 2016.01.29
申请人 Semes Co., Ltd. 发明人 Lee Yong Kwan
分类号 H05H1/46;H01J37/32 主分类号 H05H1/46
代理机构 Harness, Dickey & Pierce, P.L.C. 代理人 Harness, Dickey & Pierce, P.L.C.
主权项 1. A plasma generating device comprising: a vacuum container; a dielectric unit disposed at a part of the vacuum container; and an antenna structure for plasma generation disposed on the dielectric unit comprises, wherein the antenna structure includes four induction antennas which have the same structure, are connected in parallel with one another, and are disposed to be overlapped, wherein the induction antennas comprises: an external upper section disposed on a first quadrant of a first layer; an internal upper section connected to the external upper section and disposed on a second quadrant of the first layer; an internal lower section connected to the internal upper section and disposed on a third quadrant of a second layer disposed at a lower part of the first layer; and an external lower section connected to the internal lower section and disposed on a fourth quadrant of the second layer, and wherein one ends of the external upper sections are supplied with an RF power and the other ends of the external lower sections are grounded.
地址 Chungcheongnam-do KR