发明名称 Semiconductor device
摘要 A semiconductor device includes a plurality of gate electrodes, and a plurality of stripe contacts, each formed alternately with each of the gate electrodes along a length direction of the gate electrodes. A conductive transistor with a reference potential applied to one of the stripe contacts forming one of a source and a drain is formed. One of the gate electrodes adjacent to one of the stripe contacts forming the other of the source and the drain is used as a first dummy gate electrode. The semiconductor device further includes a metal extending over the first dummy gate electrode to electrically connect together the stripe contacts formed on opposing sides of the first dummy gate electrode, and a pad connected to one of the stripe contacts formed on opposing sides of the first dummy gate electrode, which is provided across the first dummy gate electrode from the conductive transistor.
申请公布号 US9640526(B2) 申请公布日期 2017.05.02
申请号 US201514807735 申请日期 2015.07.23
申请人 RENESAS ELECTRONICS CORPORATION 发明人 Narita Koki
分类号 H01L23/62;H01L27/02;H01L27/06;H01L23/522;H01L29/78 主分类号 H01L23/62
代理机构 McDermott Will & Emery LLP 代理人 McDermott Will & Emery LLP
主权项 1. A semiconductor device comprising: a semiconductor substrate including a main surface; a protruding portion that is a portion of the semiconductor substrate, protrudes from the main surface, has a width in a first direction of the main surface, and extends in a second direction perpendicular to the first direction in plan view, a first gate electrode and a second gate electrode which are arranged over the protruding portion and extend in the first direction in plan view; and a first stripe contact, a second stripe contact and a third stripe contact which are arranged over the protruding portion and extend in the first direction in plan view; wherein the first gate electrode is located between the first stripe contact and the second stripe contact, wherein the second gate electrode is located between the second stripe contact and the third stripe contact, wherein the second stripe contact is located between the first gate electrode and the second gate electrode, wherein the second gate electrode, the second stripe contact, the third stripe contact and a protruding portion of the semiconductor substrate are used so as to form a conductive transistor such that the second stripe contact is connected to either a source or a drain of the conductive transistor and the third stripe contact is connected to the other of the conductive transistor, wherein the first gate electrode is used as a first dummy gate electrode, wherein a first metal extends along the second direction and over the first dummy gate electrode, and is electrically connected to the first stripe contact and the second stripe contact, and wherein a first pad is electrically connected to the first metal via the first stripe contact.
地址 Tokyo JP