发明名称 |
Low density ethylene-based polymer compositions with good melt strength and high density |
摘要 |
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, such composition comprising the following properties: A) a melt index (I2) from 2.5 to 10 g/10 min; B) a density from 0.920 to 0.935 g/cc; and wherein the second polymer is present in an amount from 5 to 95 weight percent, based on the sum of the weight of the first polymer and the second polymer; and wherein the density of the of the second polymer is greater than the density of the first polymer, and wherein the first polymer has a melt index I2 greater than 2.5 g/10 min. |
申请公布号 |
US9637656(B2) |
申请公布日期 |
2017.05.02 |
申请号 |
US201414787434 |
申请日期 |
2014.04.30 |
申请人 |
Dow Global Technologies LLC |
发明人 |
Züercher Karl;den Doelder Cornelis F. J.;Mangnus Marc A. |
分类号 |
C08L23/06;C09D123/06;D01F6/04 |
主分类号 |
C08L23/06 |
代理机构 |
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代理人 |
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主权项 |
1. A composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, and a second ethylene-based polymer, formed by a high pressure, free-radical polymerization process comprising at least one autoclave reactor, such composition comprising the following properties:
A) a melt index (I2) from 2.5 to 10 g/10 min; B) a density from 0.920 to 0.935 g/cc; and wherein the second polymer is present in an amount from 5 to 95 weight percent, based on the sum of the weight of the first polymer and the second polymer; and wherein the density of the of the second polymer is greater than the density of the first polymer, and wherein the first polymer has a melt index I2 greater than 2.5 g/10 min; and wherein the second polymer has a density greater than 0.926 g/cc, a melt index I2 greater than 2.6 dg/min, and a Mw(abs) greater than 120,000 g/mole. |
地址 |
Midland MI US |