发明名称 Laminated polishing pad and method for producing same
摘要 A method for manufacturing a laminated polishing pad of the present invention, comprising the steps of: forming a polishing layer by providing a light transmitting region in an opening A of a polishing region; providing an adhesive member X on one side of the polishing layer, wherein the adhesive member X contains a hot-melt adhesive; providing a removable protective member on a part of the adhesive member X corresponding to the light transmitting region; bonding a support layer to the adhesive member X on which the removable protective member is provided; and removing a part of the support layer corresponding to the light transmitting region and also removing the removable protective member to form an opening B.
申请公布号 US9636796(B2) 申请公布日期 2017.05.02
申请号 US201314390959 申请日期 2013.02.28
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 Nakamura Kenji
分类号 B24B37/005;B24B37/22;B32B3/10;H01L21/306;B24B37/20;B24B37/013;B32B37/18;B32B38/10;B32B37/12;B32B38/00 主分类号 B24B37/005
代理机构 Law Office of Katsuhiro Arai 代理人 Law Office of Katsuhiro Arai
主权项 1. A method for manufacturing a laminated polishing pad, comprising the steps of: forming a polishing layer by providing a light transmitting region in an opening A of a polishing region; providing an adhesive member X on one side of the polishing layer, wherein the adhesive member X contains a hot-melt adhesive; providing a removable protective member on a part of the adhesive member X corresponding to the light transmitting region; bonding a support layer to the adhesive member X on which the removable protective member is provided; and removing a part of the support layer corresponding to the light transmitting region and also removing the removable protective member to form an opening B.
地址 Newark DE US