| 主权项 |
1. A method of forming a resist pattern, comprising:
forming a resist film on a substrate using a resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of the acid; exposing the resist film; and patterning the exposed resist film by negative-tone development using a developing solution containing an organic solvent, to form a resist pattern, the resist composition comprising a polymeric compound comprising a structural unit (a01) represented by general formula (a01-1) shown below, at least one structural unit (a0-2) selected from the group consisting of a structural unit represented by general formula (a02-1-1) shown below and a structural unit represented by general formula (a02-2-1) shown below, a structural unit (a03) represented by general formula (a03-1) shown below, a structural unit (a04) represented by general formula (a04-1) shown below and a structural unit (a05) containing a polar group-containing aliphatic hydrocarbon group, provided that the structural units that fall under the definition of structural units (a01) to (a04) are excluded: wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; La011 represents —CO—, —CO—O—(Va01-CO—O—)na011-, —O—CO—, —CO—N(R′)—, —CO—NH—CO— or —CO—NH—CS—; Va01 represents a divalent linking group or a single bond; na011 represents 0 or 1; R′ represents a hydrogen atom or a methyl group; Ra011 represents a polycyclic group containing at least one structure selected from the group consisting of —O—CO— and —SO2— in the ring skeleton thereof, a cyclic group containing a structure —CO—N< in the ring skeleton thereof, or a cyclic group having a group represented by formula —Va001-N(Ra012)(Ra013) as a substituent; Va001 represents —CO— or —SO2—; Ra012 and Ra013 each independently represent a hydrogen atom, —CO—Ra014 or —SO2—Ra015; and Ra014 and Ra015 each independently represents an alkyl group of 1 to 5 carbon atoms; provided that, when La011 represents —CO—N(R′)—, Ra011 can represent a monocyclic group containing —O—CO— in the ring skeleton thereof; wherein each R independently represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va021 and Va022 each independently represent a divalent linking group or a single bond; na021 and na022 independently represents 0 or 1; Ra021 represents a polycyclic alicyclic hydrocarbon group; Ra022 and Ra023 independently represent an alkyl group of 1 to 5 carbon atoms; Ra024 is a group which forms an alicyclic hydrocarbon group with the carbon atom bonded to Ra025; Ra026 represents a hydrogen atom or an alicyclic hydrocarbon group optionally having a substituent; provided that, when the total number of carbon atoms within the alicyclic hydrocarbon group formed by Ra024 and Ra026 is 3 to 7, Ra025 is an alkyl group of 1 to 10 carbon atoms; and when the total number of carbon atoms is 8 or more, Ra025 is an alkyl group of 2 to 10 carbon atoms; wherein, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va031 represents a divalent linking group or a single bond; na031 represents 0 or 1; and Ra031 represents a hydrocarbon group of 2 or more carbon atoms optionally having a fluorine atom; and wherein R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms; Va041 represents a divalent linking group or a single bond; na041 represents 0 or 1; Ra041, Ra042, Ra043 and Ra044 each independently represent a linear or branched alkyl group of 1 to 5 carbon atoms optionally having a substituent; and Ra045 represents a linear or branched alkyl group of 1 to 10 carbon atoms optionally having a substituent. |
