发明名称 Phase-shift mask
摘要 The present invention provides a phase-shift mask comprising a light shading region which is covered by a light shading pattern and a light transmission region which is not covered by the light shading pattern, the light shading pattern comprises a symmetrical part and an asymmetrical part provided outside the symmetrical part, wherein, an optical blocking unit is provided in a part of the light transmission region outside the symmetrical part away from the asymmetrical part, so that intensity of light transmitted through the part of the light transmission region provided with the optical blocking unit is reduced. During an exposure process using the phase-shift mask of the present invention, the obtained exposure intensity is more uniform.
申请公布号 US9638993(B2) 申请公布日期 2017.05.02
申请号 US201414494627 申请日期 2014.09.24
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 Li Wusheng
分类号 G03F1/26;H01L27/12;G03F1/36;H01L29/417;H01L29/66 主分类号 G03F1/26
代理机构 Nath, Goldberg & Meyer 代理人 Nath, Goldberg & Meyer ;Goldberg Joshua B.;Blackman Scott H.
主权项 1. A phase-shift mask used for forming a source, a drain and a data line of a thin film transistor, comprising a light shading region which is covered by a light shading pattern and a light transmission region which is not covered by the light shading pattern, the light shading pattern comprises a symmetrical part and an asymmetrical part provided on an outside portion of the symmetrical part, wherein the symmetrical part is symmetrical about a symmetrical axis and the symmetrical part comprises a source pattern for forming the source and a drain pattern for forming the drain, and the asymmetrical part is asymmetrical about the symmetrical axis and the asymmetrical part comprises a data line pattern for forming the data line and a connection part pattern for forming a connection part between the data line and the source, wherein the source pattern is a U-shaped pattern, and the drain pattern is a stick-shaped pattern inserted into a recessed part of the U-shaped pattern, and wherein, an optical blocking unit that is asymmetrical about the light shading pattern is provided in the light transmission region on another outside portion of the symmetrical part away from the asymmetrical part, so that intensity of light transmitted through the part of the light transmission region provided with the optical blocking unit is reduced.
地址 Beijing CN