Bismuth oxide-based addictive for laser marking

摘要

The present invention is directed to a bismuth oxide-based additive for laser marking containing oxygen-deficient bismuth oxide represented by the general formula: Bi2O(3-x) (provided that x is 0.01 or more and 0.3 or less and x represents the amount of oxygen deficiency calculated according to the formula: x=3−O1s/Bi4f×2 from the ratio (O1s/Bi4f) of the peak area attributed to the 1s electrons of oxygen bonded to bismuth to the peak area attributed to the 4f electrons of bismuth obtained by X-ray photoelectron spectrometry), which enables marking with excellent blackness and contrast without causing undesirable coloration of a resin composition regardless of the type or shape of a resin to be used.

主权项

1. An additive for laser marking, comprising oxygen-deficient bismuth oxide represented by the general formula: Bi2O(3-x) (provided that x is 0.01 or more and 0.3 or less), wherein in the general formula, x represents the amount of oxygen deficiency calculated according to the following formula (1) from the ratio (O1s/Bi4f) of the peak area attributed to the 1s electrons of oxygen bonded to bismuth to the peak area attributed to the 4f electrons of bismuth obtained by X-ray photoelectron spectrometry:
x=3−O1s/Bi4f×2  (1).