发明名称 ELECTROLYTIC CELL ETCHING
摘要 The present invention relates to the manufacture of electrolytic cells. Specifically, the invention relates to the manufacture of electrolytic cells which do not prematurely short out and which do not provide false readings upon a readout of the information stored in the cell. The electrolytic cells include an inner conductor which is plated with an active material and wherein the active material is plated on the inner conductor using a waterless plating solution and wherein the actual plating occurs at a temperature substantially lower than room temperature, for example, 5 DEG +/- 5 DEG C. The waterless plating solution can be a solution of silver nitrate in dimethylsulfoxide. The invention also includes the use of an outer cup electrode which receives the inner electrode and wherein the outer cup electrode is treated to remove strain within the cup electrode. The treatment by thermally etching the cup electrode to remove the strain and at the same time eliminate surface contaminations. As a final step to the construction of the electrolytic cell and after the inner electrode is sealed across an open end of the cup electrode the electrolytic cell is subjected to an elevated temperature substantially above room temperature so as to cure the electrolytic cell and create a condition of equilibrium within the electrolytic cell.
申请公布号 US3653998(A) 申请公布日期 1972.04.04
申请号 USD3653998 申请日期 1968.08.21
申请人 BISSETT-BERMAN CORP.:THE 发明人 JAMES P. SANDSTROM
分类号 C23G5/00;C25D3/46;G01N27/42;(IPC1-7):C23F1/04;H05K3/06 主分类号 C23G5/00
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