发明名称 |
COLOR RESIST MASK SHEET AND METHOD OF USE THEREOF |
摘要 |
The present invention provides a color resist mask sheet and a method of use thereof. The color resist mask sheet includes an align coat mark region and an align test mark region. The align coat mark region includes a plurality of equally spaced align coat marks of coat color resist; the align test mark region includes a plurality of equally spaced align test marks for coating the test color resist, wherein each align test mark corresponds to each align coat mark. |
申请公布号 |
US2017115526(A1) |
申请公布日期 |
2017.04.27 |
申请号 |
US201514896672 |
申请日期 |
2015.11.06 |
申请人 |
SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. |
发明人 |
XIONG Yuan |
分类号 |
G02F1/1335;B05D1/32 |
主分类号 |
G02F1/1335 |
代理机构 |
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代理人 |
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主权项 |
1. A color resist mask sheet used for coordinating with a mask aligner stepper to manufacture a color resist test sheet, comprising:
an align test mark region comprising a plurality of equally spaced align test marks; an align coat mark region comprising a plurality of equally spaced align coat marks, wherein the align coat marks and the align test marks cooperate to locate a coat region of test color resist; and a pattern mask region comprising a plurality of mask patterns for coating the test color resist; wherein each align test mark corresponds to each align coat mark; a space between the adjacent align coat marks, and a space between the adjacent align test marks are determined according to a space between adjacent pixels and a length of an edge of a single exposure region of the mask aligner stepper; a space between the align coat mark and the corresponding align test mark is determined according to the space between adjacent pixels; wherein a pattern of the align test mark is different from a pattern of the align coat mark; wherein the space between the adjacent align coat marks is greater than or equal to the length of the edge of the single exposure region of the mask aligner stepper, a transverse space between the adjacent align test marks is greater than or equal to the length of the edge of the single exposure region of the mask aligner stepper, a portrait space between the adjacent align test marks is equal to a portrait space between the adjacent pixels. |
地址 |
Shenzhen, Guangdong CN |