发明名称 COLOR RESIST MASK SHEET AND METHOD OF USE THEREOF
摘要 The present invention provides a color resist mask sheet and a method of use thereof. The color resist mask sheet includes an align coat mark region and an align test mark region. The align coat mark region includes a plurality of equally spaced align coat marks of coat color resist; the align test mark region includes a plurality of equally spaced align test marks for coating the test color resist, wherein each align test mark corresponds to each align coat mark.
申请公布号 US2017115526(A1) 申请公布日期 2017.04.27
申请号 US201514896672 申请日期 2015.11.06
申请人 SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD. 发明人 XIONG Yuan
分类号 G02F1/1335;B05D1/32 主分类号 G02F1/1335
代理机构 代理人
主权项 1. A color resist mask sheet used for coordinating with a mask aligner stepper to manufacture a color resist test sheet, comprising: an align test mark region comprising a plurality of equally spaced align test marks; an align coat mark region comprising a plurality of equally spaced align coat marks, wherein the align coat marks and the align test marks cooperate to locate a coat region of test color resist; and a pattern mask region comprising a plurality of mask patterns for coating the test color resist; wherein each align test mark corresponds to each align coat mark; a space between the adjacent align coat marks, and a space between the adjacent align test marks are determined according to a space between adjacent pixels and a length of an edge of a single exposure region of the mask aligner stepper; a space between the align coat mark and the corresponding align test mark is determined according to the space between adjacent pixels; wherein a pattern of the align test mark is different from a pattern of the align coat mark; wherein the space between the adjacent align coat marks is greater than or equal to the length of the edge of the single exposure region of the mask aligner stepper, a transverse space between the adjacent align test marks is greater than or equal to the length of the edge of the single exposure region of the mask aligner stepper, a portrait space between the adjacent align test marks is equal to a portrait space between the adjacent pixels.
地址 Shenzhen, Guangdong CN