| 主权项 |
1. A Color Filter on Array (COA) substrate manufacturing method comprising:
forming a thin-film transistor on a base substrate, wherein the thin-film transistor includes a first metal layer on the base substrate, a first insulation layer disposed on the first metal layer, a semiconductor active layer disposed on the first insulation layer, and a second metal layer disposed on the semiconductor active layer, wherein the second metal layer forms a drain electrode of the thin-film transistor; forming a second insulation layer on the thin-film transistor; forming a color resist layer on the second insulation layer; forming a third insulation layer on the color resist layer; forming at least one through hole which exposes the drain electrode of the thin-film transistor, and sequentially passes through the third insulation layer, the color resist layer and the second insulation layer; wherein, the method further comprises: forming an ITO film layer on the third insulation layer, wherein, the ITO film layer includes a vias-region ITO film layer located on and attached in the through hole and a non vais-region ITO film layer located outside the through hole; forming a photoresist layer on the ITO film layer; performing a light-shielding process to the photoresist layer located only on the vias-region ITO film layer, and performing an exposure process to the photoresist layer on the non vias-region ITO film layer; and developing the photoresist layer on the vias-region ITO film layer and the photoresist layer on the non vias-region ITO film layer in order to obtain a photoresist layer plug only covered on the vias-region ITO film layer. |
