发明名称 DISPLAY DEVICE
摘要 A display device includes a substrate, a display region, a peripheral region, an insulating layer which is disposed on a gate signal line and a conductor, a conductive layer which is disposed on the insulating layer and crosses a plurality of gate signal lines and the conductor in the peripheral region, a first semiconductor film which is disposed between the insulating layer and the conductive layer, and a second semiconductor film which is disposed between the insulating layer and the conductive layer and which is separated from the first semiconductor film. The conductive layer is connected to the plurality of gate signal lines via a plurality of diodes, and the plurality of gate signal lines are arranged in the display region and the peripheral region. A length of the conductor differs from a length of the gate signal line in the display region and the peripheral region.
申请公布号 US2017115539(A1) 申请公布日期 2017.04.27
申请号 US201715398848 申请日期 2017.01.05
申请人 Japan Display Inc. ;Panasonic Liquid Crystal Display Co., Ltd. 发明人 ITAKURA Hirokazu;KOMENO Hitoshi;TAKAHASHI Tomoaki
分类号 G02F1/1362;H01L27/02;H01L27/12 主分类号 G02F1/1362
代理机构 代理人
主权项 1. A display device having a display region and peripheral region comprising: a plurality of gate signal line, an end of the gate signal line is disposed in the peripheral region; a plurality of image signal line, an end of the image signal line is disposed in the peripheral region; a plurality of common signal line, an end of the common signal line is disposed in the peripheral region; a ground wire is disposed in the peripheral region and in parallel with the video signal line; a plurality of first diode circuit and second diode circuit are disposed in the peripheral region, the first diode circuit and the second diode circuit are connected to the respective gate signal line and the ground wire; a first semiconductor film is formed between a layer on which the gate signal line is formed and a layer on which the ground wire is formed, a second semiconductor film is formed between a layer on which the common signal line is formed and the layer on which the ground wire is formed, and the first semiconductor film and the second semiconductor film are formed in the same layer and are formed to be separated from each other.
地址 Tokyo JP