| 发明名称 |
SYSTEMS AND METHODS FOR DETERMINING THE SUITABILITY OF RF SOURCES IN ULTRAVIOLET SYSTEMS |
| 摘要 |
A UV system for irradiating a substrate includes a RF source capable of generating RF energy, a UV lamp capable of emitting UV energy when excited by the RF energy generated by the RF source, and a monitor coupled to the RF source. The monitor includes data relating to the RF source. The UV system further includes a controller capable of communication with the monitor, and the controller determines if the RF source is suitable for operation with the UV system based on the data of the monitor and/or the end of its useful life. |
| 申请公布号 |
US2017117131(A1) |
申请公布日期 |
2017.04.27 |
| 申请号 |
US201515317965 |
申请日期 |
2015.07.06 |
| 申请人 |
NORDSON CORPORATION |
发明人 |
KHOURY James M. |
| 分类号 |
H01J65/04;H01R4/04;H05B41/36;H01R13/15;H01J61/52;H01J61/56 |
主分类号 |
H01J65/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A UV system for irradiating a substrate, the system comprising:
a RF source configured to generate RF energy; a UV lamp configured to emit UV energy when excited by the RF energy generated by said RF source; a monitor coupled to said RF source, said monitor configured to generate data relating to said RF source; and a controller configured to receive said data from said monitor, and determine whether said RF source is suitable for operation with said UV system based on said data. |
| 地址 |
Westlake OH US |
