| 发明名称 |
TEMPLATE SUBSTRATE AND MANUFACTURING METHOD THEREOF |
| 摘要 |
A template substrate according to an embodiment includes a first face and a second face on an opposite side to the first face. A first region is located on the first face to be protruded from a peripheral portion thereof. A second region is located at least at an end portion of the first region, and is a region in which an alignment mark used at a time of transfer of a pattern is intended to be formed. The second region contains a first impurity and a second impurity. |
| 申请公布号 |
US2017115581(A1) |
申请公布日期 |
2017.04.27 |
| 申请号 |
US201615263954 |
申请日期 |
2016.09.13 |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
KANAMITSU Shingo;ITO Masamitsu |
| 分类号 |
G03F9/00;G03F7/00 |
主分类号 |
G03F9/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A template substrate comprising:
a first face; a second face on an opposite side to the first face; a first region located on the first face to be protruded from a peripheral portion thereof; and a second region located at least at an end portion of the first region, the second region in which an alignment mark used at a time of transfer of a pattern is intended to be formed, and the second region containing a first impurity and a second impurity. |
| 地址 |
Tokyo JP |
