发明名称 WATER CONTENT OF A PART OF PLANT EVALUATION METHOD AND WATER CONTENT OF A PART OF PLANT EVALUATION APPARATUS
摘要 In a water content evaluation method, when water content of a part of a plant is evaluated, a white reference substrate (background material) is disposed so as to cover a back surface of a leaf of plant. A first beam source radiates a near infrared beam (reference beam) with a wavelength of 905 nm that has a characteristic of tending not to be absorbed in water toward leaf. A second beam source radiates a near infrared beam (measuring beam) with a wavelength of 1550 nm that has a characteristic of tending to be absorbed in water toward the leaf. Threshold level setter/water content index detector calculates a water content index of one leaf that is total sum Σ Ln (I905/I1550) of the reflection intensity rate at all irradiation positions of the leaf based on a reflection light of a reference beam and a reflection light of a measuring beam that are reflected on all irradiation positions of the leaf.
申请公布号 US2017115210(A1) 申请公布日期 2017.04.27
申请号 US201615295065 申请日期 2016.10.17
申请人 PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. 发明人 FUJIYAMA Takeshi;TERASHIMA Yuuji
分类号 G01N21/3554;G01N21/359;G01N21/84 主分类号 G01N21/3554
代理机构 代理人
主权项 1. A water content evaluation apparatus which evaluates water content of a part of a plant, the water content evaluation apparatus comprising: a first light source which radiates a laser reference beam of a first wavelength toward a plant at irradiation positions of the plant, the laser reference beam of the first wavelength not being absorbed by water; a second light source which radiates a laser measuring beam of a second wavelength toward the plant at the irradiation positions of the plant, the laser measuring beam of the second wavelength being absorbed by water; and a controller that executes instructions, the instructions, when executed by the controller, causing the controller to perform operations including: calculating water content of the plant at all the irradiation positions of the plant based on a first reflection light of the laser reference beam that is reflected at all the irradiation positions of the plant and a second reflection light of the laser measuring beam that is reflected at all the irradiation positions of the plant.
地址 Osaka JP