发明名称 |
REDISTRIBUTION LAYER STRUCTURE, SEMICONDUCTOR SUBSTRATE STRUCTURE, SEMICONDUCTOR PACKAGE STRUCTURE, CHIP STRUCTURE, AND METHOD OF MANUFACTURING THE SAME |
摘要 |
The present disclosure relates to redistribution layer structures useful in semiconductor substrate packages, semiconductor package structures, and chip structures. In an embodiment, a redistribution layer structure includes a dielectric layer, an anti-plating layer, and a conductive material. The dielectric layer defines one or more trenches. The conductive material is disposed in the trench(es), and the anti-plating layer is disposed on a surface of the dielectric layer. |
申请公布号 |
US2017117240(A1) |
申请公布日期 |
2017.04.27 |
申请号 |
US201514919343 |
申请日期 |
2015.10.21 |
申请人 |
Advanced Semiconductor Engineering, Inc. |
发明人 |
WENG Chao-Fu |
分类号 |
H01L23/00 |
主分类号 |
H01L23/00 |
代理机构 |
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代理人 |
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主权项 |
1. A redistribution layer structure, comprising:
a dielectric layer comprising an upper portion and a lower portion, the lower portion of the dielectric layer defining at least one trench, and the upper portion of the dielectric layer comprising an anti-plating layer disposed on a surface of the lower portion of the dielectric layer and defining an opening; and a conductive material plated in the trench within the opening, wherein the anti-plating layer does not extend over the trench. |
地址 |
Kaohsiung TW |