PHYSICAL VAPOR DEPOSITION SYSTEM WITH TARGET MAGNETS CONTROLLED TO ONLY BE ABOVE WORKPIECE

摘要

A circular PVD chamber has a plurality of sputtering targets mounted on a top wall of the chamber. A pallet in the chamber is coupled to a motor for rotating the pallet about its center axis. The pallet has a diameter less than the diameter of the circular chamber. The pallet is also shiftable in an XY direction to move the center of the pallet beneath any of the targets so all areas of a workpiece supported by the pallet can be positioned directly below any one of the targets. A scanning magnet is in back of each target and is moved, via a programmed controller, to only be above portions of the workpiece so that no sputtered material is wasted. For depositing a material onto small workpieces, a cooling backside gas volume is created between the pallet and the underside of sticky tape supporting the workpieces.

主权项

1. A method for performing a physical vapor deposition operation in a chamber comprising:
rotating a pallet, within the chamber, via a first motor coupled to the pallet, the pallet supporting a workpiece; scanning the magnet back and forth in an arc behind the target, wherein the magnet is smaller than the target; shifting the magnet, by a linear actuator coupled to the magnet, generally radially with respect to the arc to allow the magnet to move substantially between an area of the target closest to a center of the chamber and an area of the target furthest from the center of the chamber; and controlling the linear actuator such that the magnet is scanned substantially only over portions of the workpiece that are directly below the target.