发明名称 Method and measuring device for continuously measuring the abbe number
摘要 Method and device for measuring the Abbe number in a process liquid. Light generates successively at wavelengths of 486.1 nm, 589.3 nm and 656.3 nm and different light wavelengths are directed successively through a measuring window in the process liquid so total reflection occurs at each wavelength on the measuring window surface and process liquid. Partial light reflected at each wavelength is directed to a sensor, whereby an image forms on the sensor surface; between light and dark boundary region corresponding to each wavelength critical angle, in which total reflection occurs. At each wavelength between light and dark boundary region detection by image analysis. At each wavelength, dependency between light and dark boundary region and refractive-index of process liquid measurement is detected, the Abbe number by refractive-index values obtained from:;VD=nD-1nF-nC; nD=refractive-index of process liquid to measure at 589.3 nm; nF=refractive-index at 486.1 nm; and nC=refractive-index at 656.3 nm.
申请公布号 US9632025(B2) 申请公布日期 2017.04.25
申请号 US201514702364 申请日期 2015.05.01
申请人 JANESKO OY 发明人 Kamrat Esko
分类号 G01N21/41;G01N21/43;G01N21/552 主分类号 G01N21/41
代理机构 Oliff PLC 代理人 Oliff PLC
主权项 1. A method for continuously measuring the Abbe number in a process liquid, the method comprising the steps of: generating light and directing the light through a measuring window in contact with the process liquid to the process liquid such that total reflection occurs on the surface of the measuring window and the process liquid, directing the part of the light that has been totally reflected to a sensor, whereby an image is formed on a light-sensitive surface of the sensor, the boundary between a light region and a dark region in the image corresponding to a critical angle at which the total reflection occurs, and detecting the dependency between the boundary of the light and the dark regions and the refractive index of the process liquid to be measured, wherein the light is generated successively at wavelengths of substantially 486.1 nm, 589.3 nm and 656.3 nm and the light of different wavelengths is directed successively to the measuring window by means of optics to provide a suitable angular distribution for the light and directed through the measuring window in contact with the process liquid to the process liquid, and the part of the light totally reflected at each wavelength is directed to the sensor, wherein the boundary between the light and the dark regions is detected at each wavelength by means of an image analysis, the dependency between the boundary of the light and the dark regions and the refractive index of the process liquid to be measured is determined at each wavelength, and the Abbe number is calculated by means of the refractive index values obtained from the aforementioned three wavelengths by using the formula known per se:VD=nD-1nF-nCwhere nD is the refractive index of the process liquid to be measured at a wavelength of 589.3 nm, nF is the refractive index at a wavelength of 486.1 nm, and nC is the refractive index at a wavelength of 656.3 nm.
地址 Vantaa FI