Rinse solution for pattern formation and pattern forming process

摘要

In a resist pattern forming process, a rinse solution comprising (A) a heat/acid-decomposable polymer and (B) water is effective. The pattern forming process using the rinse solution is successful in forming fine feature size patterns while minimizing the occurrence of pattern collapse. High-throughput processing is possible.

主权项

1. A rinse solution for pattern formation comprising (A) a heat/acid-decomposable polymer and (B) water;
wherein the heat/acid-decomposable polymer comprises recurring units having the formula (1) or (2):wherein R1, R2, and R3 are each independently hydrogen or an optionally substituted, C1-C30 saturated or unsaturated, monovalent organic group, and W is a C2-C30 saturated or unsaturated, divalent organic group.