| 发明名称 | Illumination device and projector | ||
| 摘要 | An illumination device includes: a light source that emits first light at a first wavelength; an integrator optical system that the first light enters; a wavelength conversion element that converts the first light transmitting through the integrator optical system into second light at a second wavelength different from the first wavelength; a wavelength separation element provided on an optical path of the first light between the integrator optical system and the wavelength conversion element; a pickup optical system that is provided between the wavelength conversion element and the wavelength separation element and receives the first light and the second light; and a chromatic aberration-correcting optical element provided at least one of between the integrator optical system and the wavelength separation element on the optical path of the first light and at downstream of the wavelength separation element on an optical path of the second light. | ||
| 申请公布号 | US9632321(B2) | 申请公布日期 | 2017.04.25 |
| 申请号 | US201514791830 | 申请日期 | 2015.07.06 |
| 申请人 | SEIKO EPSON CORPORATION | 发明人 | Akiyama Koichi |
| 分类号 | G02B27/14;G03B21/20 | 主分类号 | G02B27/14 |
| 代理机构 | Oliff PLC | 代理人 | Oliff PLC |
| 主权项 | 1. An illumination device comprising: a light source that emits first light at a first wavelength; an integrator optical system on which the first light emitted from the light source is incident; a wavelength conversion element that converts the first light transmitting through the integrator optical system into second light at a second wavelength different from the first wavelength; a wavelength separation element that is provided on an optical path of the first light between the integrator optical system and the wavelength conversion element; a pickup optical system that is provided between the wavelength conversion element and the wavelength separation element and receives the first light and the second light; and a chromatic aberration-correcting optical element that is provided in at least one positron, the at least one position including: (i) a position between the integrator optical system and the wavelength separation element on the optical path of the first light; and (ii) a position downstream of the wavelength separation element on an optical path of the second light. | ||
| 地址 | Tokyo JP | ||