发明名称 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, resist-coated mask blank, photomask and pattern forming method, and method for producing electronic device using them, and electronic device
摘要 There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by a specific formula (1), and an ionic compound (B) represented by a specific formula (2), a resist film formed by using the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method including: (a) a step of forming the resist film, (b) a step of exposing the film, and (c) a step of developing the exposed film using a developer to form a pattern.
申请公布号 US9632410(B2) 申请公布日期 2017.04.25
申请号 US201514868409 申请日期 2015.09.29
申请人 FUJIFILM Corporation 发明人 Yamaguchi Shuhei;Tsuchihashi Toru;Tsuchimura Tomotaka
分类号 G03F7/039;G03F1/50;G03F1/76;G03F7/32;G03F7/004;G03F7/20 主分类号 G03F7/039
代理机构 Jianq Chyun IP Office 代理人 Jianq Chyun IP Office
主权项 1. An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) containing a repeating unit represented by formula (1) shown below, and an ionic compound (B) represented by formula (2) shown below: wherein in formula (1) above, X1 represents a single bond or a divalent connecting group, A1 represents an (n1+1) valent aromatic ring group, each of R11, R12, and R13 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, R13 may be connected to A1 to form a ring and in this case R13 represents an alkylene group, Ra has a structure represented by formula (4) shown below, Rb is a hydrogen atom, wherein in formula (4), Rd represents an alkyl group, a cycloalkyl group or an aryl group, each of Re and Rf independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an aryl group, Rd may be connected to any one of Re and Rf or both of them to form a ring structure, M represents a single bond or a divalent connecting group, Q represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, Ra and Rb may be connected to form a ring, at least two of Ra, M and Q may be connected to form a ring, when A1 is an (n1+1) valent aromatic ring group, n1 represents an integer from 1 to 4, when n1 is 2 or more, each of a plurality of Ra, each of a plurality of Rb, each of a plurality of M and each of a plurality of Q may be the same as or different from every other Ra, Rb, M and Q, respectively, in formula (2) above, A− represents an organic acid anion, L represents a divalent connecting group, cation X+ represents a nitrogen cation, each Rx independently represents an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group or a heterocyclic group, a plurality of Rx may be connected to each other to from a ring, and the ring formed may contain a nitrogen atom, an oxygen atom or a sulfur atom, as a ring member, n2 is 3.
地址 Tokyo JP