Graphoepitaxy directed self assembly

摘要

Graphoepitaxy directed self-assembly methods generally include grafting a conformal layer of a polymer brush onto a topographic substrate. A planarization material, which functions as a sacrificial material is coated onto the topographic substrate. The planarization material is etched back to a top surface of the topographic substrate, wherein the etch back removes the polymer brush from the top surfaces of the topographic substrate. The remaining portion of the polymer brush is protected by the remaining planarization material below the top surface of the topographic substrate, which can be removed with a solvent to provide the topographic substrate with a conformal polymer brush below the top surface of the topographic substrate. The substrate is then coated with a block copolymer and annealed to direct self-assembly of the block copolymer. The methods mitigate island and/or hole defect formation.

主权项

1. A graphoepitaxy directed self-assembly method comprising:
providing a substrate having a surface with an opening therein, the opening having a boundary that includes a bottom surface, a top surface and sidewalls extending between the top and bottom surfaces; applying, over the surface, a layer of brush material that includes a functionality reactive with the surface; heating the substrate to a temperature effective to react the functionality with the surface to form a monolayer of the brush polymer material grafted to the surface; removing non-grafted brush polymer material with a solvent; applying a layer of sacrificial material over the grafted monolayer of the brush polymer material, wherein the sacrificial material is not crosslinked; etching to the top surface of substrate to remove the sacrificial material and the brush material therefrom; removing the remaining sacrificial material in the opening with a solvent to form a conformal brush layer on the sidewalls and the bottom surface of the opening; and coating a block copolymer onto the substrate and annealing to direct self-assembly of the block copolymer.