| 发明名称 | Lithography apparatus, method for lithography and stage system | ||
| 摘要 | Provided are a lithography apparatus, a method for lithography and a stage system. The lithography apparatus includes a reticle stage having a reticle, at least one nozzle on at least one surface of the reticle stage and configured to allow shielding gas to flow to a surface of the reticle to form an air curtain, and a gas supply unit configured to supply the nozzle with the shielding gas. | ||
| 申请公布号 | US9632437(B2) | 申请公布日期 | 2017.04.25 |
| 申请号 | US201313942854 | 申请日期 | 2013.07.16 |
| 申请人 | Samsung Electronics Co., Ltd. | 发明人 | Park Jin-Hong;Yeo Jeong-Ho;Park Joo-On;Park Chang-Min |
| 分类号 | G03F7/20 | 主分类号 | G03F7/20 |
| 代理机构 | Harness, Dickey & Pierce, P.L.C. | 代理人 | Harness, Dickey & Pierce, P.L.C. |
| 主权项 | 1. A lithography apparatus, comprising: a reticle stage having a reticle that is an extreme ultraviolet (EUV) mask; a plurality of nozzles on at least one surface of the reticle stage and configured to direct shielding gas to flow to a surface of the reticle to form an air curtain, one of the plurality of nozzles and another one of the plurality of nozzles being configured to direct the shielding gas to flow in an orthogonal direction with respect to each other, and in parallel with the surface of the reticle, the plurality of nozzles being configured to move together with the reticle stage, and the shielding gas protecting the surface of the reticle; and a gas supply unit configured to supply the plurality of nozzles with the shielding gas. | ||
| 地址 | Gyeonggi-do KR | ||