Environmental system including a transport region for an immersion lithography apparatus

摘要

An immersion lithography apparatus includes an optical assembly that projects a beam onto a substrate through an immersion liquid, a containment member surrounding a path of the beam, a stage holding the substrate, an isolator having a first actuator which limits vibrations of the optical assembly, and a support system having a second actuator to support the containment member and move it by the second actuator. The containment member includes a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.

主权项

1. An immersion lithography apparatus comprising:
an optical assembly including an optical element, the optical assembly configured to project a beam onto a substrate through an immersion liquid; a containment member arranged to surround a path of the beam; a stage on which the substrate is held, the substrate on the stage being moved below a bottom surface of the containment member with the substrate being spaced from the bottom surface of the containment member; an isolator having a first actuator which limits vibrations of the optical assembly; and a support system having a second actuator, the containment member being supported via the support system, and the containment member being movable by the second actuator, wherein the containment member includes: a first supply opening via which water as the immersion liquid is released, a recovery opening via which the immersion liquid is recovered from a gap between the containment member and the substrate and/or the stage, and a second supply opening via which the water is released to the gap between the containment member and the substrate and/or the stage, the second supply opening being provided radially inward of the recovery opening.