Shrink material and pattern forming process

摘要

A shrink material is provided comprising a polymer comprising recurring units of formula (1) and a solvent containing an anti-vanishing solvent. A pattern is formed by applying a resist composition comprising a base resin and an acid generator onto a substrate to form a resist film, exposing, developing in an organic solvent developer to form a negative resist pattern, applying the shrink material onto the pattern, and removing the excessive shrink material with an organic solvent for thereby shrinking the size of holes and/or slits in the pattern.;

主权项

1. A shrink material comprising a polymer and a solvent containing an anti-vanishing solvent which does not cause a resist pattern after development to vanish,
said polymer comprising recurring units having the formula (1): wherein A is a single bond or a C1-C10 alkylene group which may contain an ethereal oxygen atom at an intermediate of the chain, R1 is hydrogen, fluorine, methyl or trifluoromethyl, R2 is each independently hydrogen, halogen, an optionally halo-substituted, straight, branched or cyclic, C2-C8 acyloxy group, an optionally halo-substituted, straight, branched or cyclic, C1-C6 alkyl group, or an optionally halo-substituted, straight, branched or cyclic, C1-C6 alkoxy group, L is hydrogen, a straight, branched or cyclic, C1-C10 monovalent aliphatic hydrocarbon group which may contain an ethereal oxygen atom, carbonyl moiety or carbonyloxy moiety at an intermediate of the chain, or an optionally substituted, monovalent aromatic ring-containing group, Rx and Ry are each independently hydrogen, a straight or branched C1-C15 alkyl group which may be substituted with a hydroxyl or alkoxy moiety, or an optionally substituted monovalent aromatic ring-containing group, excluding that Rx and Ry are hydrogen at the same time, and f is an integer of 1 to 3, s is an integer of 0 to 2, a is equal to (5+2s−f), and m is 0 or 1, said shrink material further comprising a salt having the formula (9):
R11—CO2−M+  (9)wherein R11 is a straight, branched or cyclic C1-C20 alkyl group, straight, branched or cyclic C2-C20 alkenyl group or C6-C20 monovalent aromatic ring-containing group, in which some or all carbon-bonded hydrogen atoms may be substituted by fluorine, lactone ring-containing moiety, lactam ring-containing moiety or hydroxyl moiety, and in which an ether, ester or carbonyl moiety may intervene in a carbon-carbon bond, and M+ is a sulfonium, iodonium or ammonium cation.