发明名称 PELLICLE FOR EUV
摘要 A pellicle is proposed in which an adhesive layer which adheres a pellicle film to a pellicle frame is mixed (filled) with powder of thermally conductive material such as metallic compound so that the heat generated by the strong EUV ray is quickly passed to the pellicle frame from the pellicle film lest the latter is deformed by the heat.
申请公布号 US2017108771(A1) 申请公布日期 2017.04.20
申请号 US201615296507 申请日期 2016.10.18
申请人 Shin-Etsu Chemical Co., Ltd. 发明人 HORIKOSHI Jun
分类号 G03F1/64;G03F7/20 主分类号 G03F1/64
代理机构 代理人
主权项 1. A pellicle for EUV comprising a pellicle frame having two end faces, an adhesive layer laid on one of said end faces of the pellicle frame, a pellicle film which is tensely adhered to the pellicle frame via said adhesive layer, and an agglutinant layer laid on another one of said end faces of the pellicle frame, wherein said adhesive layer is an adhesive composition made of 100 mass parts of an adhesive material and 100 through 4,000 mass parts of thermally conductive filler.
地址 Tokyo JP