| 发明名称 |
WET ETCHING APPARATUS |
| 摘要 |
The present invention provides a wet etching apparatus. The wet etching apparatus comprises: an etching chamber, comprising an etching chamber inlet at a front end and an etching chamber outlet at a rear end, wherein in the etching chamber, a film to be etched on a substrate is subject to etching with an etching liquid; and a decrystallization device, which washes residual etching liquid or etching liquid crystal formed by the etching liquid at the etching chamber inlet and/or etching chamber outlet with a washing liquid. By means of the decrystallization device, residual etching liquid or etching liquid crystal formed by the etching liquid at the etching chamber inlet and the etching chamber outlet can be effectively removed, thus improving operation ratio and cleanness of the apparatus as well as quality of products. |
| 申请公布号 |
US2017110344(A1) |
申请公布日期 |
2017.04.20 |
| 申请号 |
US201514906866 |
申请日期 |
2015.08.14 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. |
发明人 |
Xue Dapeng |
| 分类号 |
H01L21/67 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A wet etching apparatus, comprising:
an etching chamber, comprising an etching chamber inlet at a front end and an etching chamber outlet at a rear end, wherein in the etching chamber, a film to be etched on a substrate is subject to etching with an etching liquid; and a decrystallization device, which washes residual etching liquid or etching liquid crystal formed by the etching liquid at the etching chamber inlet and/or etching chamber outlet with a washing liquid. |
| 地址 |
Beijing CN |
