CONTROLLING AN ION BEAM IN A WIDE BEAM CURRENT OPERATION RANGE

摘要

Provided herein are approaches for controlling an ion beam within an accelerator/decelerator. In an exemplary approach, an ion implantation system includes an ion source for generating an ion beam, and a terminal suppression electrode coupled to a terminal, wherein the terminal suppression electrode is configured to conduct the ion beam through an aperture of the terminal suppression electrode and to apply a first potential to the ion beam from a first voltage supply. The system further includes a lens coupled to the terminal and disposed adjacent the terminal suppression electrode, wherein the lens is configured to conduct the ion beam through an aperture of the lens and to apply a second potential to the ion beam from a second voltage supply. In an exemplary approach, the lens is electrically insulated from the terminal suppression electrode and independently driven, thus allowing for an increased beam current operation range.

主权项

1. An accelerator/decelerator to control an ion beam, the accelerator/decelerator comprising:
a first electrode coupled to a terminal, the first electrode configured to conduct the ion beam through an aperture of the first electrode and to apply a first potential to the ion beam from a first voltage supply; a lens adjacent the first electrode, the lens coupled to the terminal and electrically insulated from the first electrode, wherein the lens is configured to conduct the ion beam through an aperture of the lens and to apply a second potential to the ion beam from a second voltage supply, the second potential applied independently from the first potential; a second electrode configured to receive the ion beam from the lens; and a third electrode assembly configured to receive the ion beam from the second electrode