发明名称 |
Charged Particle Beam Apparatus |
摘要 |
The invention has an object to provide a charged particle beam device in which it is possible to perform proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. In order to achieve the above object, according to the invention, there is provided a charged particle beam device including: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value. |
申请公布号 |
US2017110285(A1) |
申请公布日期 |
2017.04.20 |
申请号 |
US201615292832 |
申请日期 |
2016.10.13 |
申请人 |
Hitachi High-Technologies Corporation |
发明人 |
FUKUDA Muneyuki;MOMONOI Yoshinori;MIURA Akihiro;SASAJIMA Fumihiro;MITO Hiroaki |
分类号 |
H01J37/22;H01J37/28 |
主分类号 |
H01J37/22 |
代理机构 |
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代理人 |
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主权项 |
1. A charged particle beam device comprising:
an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value. |
地址 |
Tokyo JP |