PLASMA PROCESSING APPARATUS, METHOD OF OPERATING PLASMA PROCESSING APPARATUS, AND POWER SUPPLY DEVICE

摘要

A plasma processing apparatus according to an embodiment includes a processing container, a mounting table, a plurality of heaters, and a power supply device. The mounting table is provided in the processing container. The plurality of heaters are provided in the mounting table. The power supply device supplies electric power to the plurality of heaters. The power supply device includes a plurality of transformers and a plurality of zero-cross control type solid state relays (SSRs). The plurality of transformers are configured to step down a voltage from an alternating-current power source. Each of the plurality of transformers includes a primary coil and a secondary coil. The primary coil is connected to the alternating-current power source. Each of the plurality of SSRs is provided between one corresponding heater among the plurality of heaters and the secondary coil of one corresponding transformer among the plurality of transformers.

主权项

1. A plasma processing apparatus for performing plasma processing on a workpiece, comprising:
a processing container; a mounting table provided in the processing container; a plurality of heaters which are provided in the mounting table; and a power supply device which supplies electric power to the plurality of heaters, wherein the power supply device includes: a plurality of transformers configured to step down a voltage from an alternating-current power source, each of the plurality of transformers including a primary coil connected to the alternating-current power source and a secondary coil; and a plurality of zero-cross control type solid state relays each of which is provided between one corresponding heater among the plurality of heaters and the secondary coil of one corresponding transformer among the plurality of transformers.