| 发明名称 |
FORMING SACRIFICIAL STRUCTURES USING PHASE-CHANGE MATERIALS THAT SUBLIMATE |
| 摘要 |
A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material. |
| 申请公布号 |
US2017106605(A1) |
申请公布日期 |
2017.04.20 |
| 申请号 |
US201615391723 |
申请日期 |
2016.12.27 |
| 申请人 |
Palo Alto Research Center Incorporated |
发明人 |
Ng Tse Nga;Hsieh Bing R.;Ready Steven E. |
| 分类号 |
B29C67/00;B33Y10/00 |
主分类号 |
B29C67/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method, comprising:
depositing a first layer of a polymer material; depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure; depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material; and removing the sublimable material to form a first hollow space defined by the first and second layers of the polymer material. |
| 地址 |
Palo Alto CA US |
