Simultaneous Retargeting Of Layout Features Based On Process Window Simulation

摘要

Various aspects of the disclosed technology relate to techniques of retargeting layout features. A process window simulation on a layout design is performed to generate process window information that comprises predicted print positions of layout features computed under various process conditions. Retargeted print positions for a plurality of edge fragments in the layout design are then determined based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints represented based on the process window information and specification limits for printed layout features. Based on the retargeted print positions, positions of the plurality of edge fragments are adjusted for optical proximity correction.

主权项

1. One or more non-transitory computer-readable media storing computer-executable instructions for causing one or more processors to perform a method, the method comprising:
performing a process window simulation on a layout design to generate process window information, the layout design corresponding to at least a portion of an integrated circuit, the process window information comprising predicted print positions of layout features computed under various process conditions; determining retargeted print positions for a plurality of edge fragments in the layout design based on minimizing a combined change of targeted print positions for the plurality of edge fragments under constraints on changes of the targeted print positions for the plurality of edge fragments, the constraints being represented based on the process window information and specification limits for printed layout features; and adjusting positions of the plurality of edge fragments for optical proximity correction based on the retargeted print positions.