发明名称 |
Lithographic Patterning |
摘要 |
This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer. |
申请公布号 |
US2017108778(A1) |
申请公布日期 |
2017.04.20 |
申请号 |
US201615269202 |
申请日期 |
2016.09.19 |
申请人 |
Brookhaven Science Associates, LLC |
发明人 |
Black Charles Thomas;Stein Aaron;Wright Gwen;Yager Kevin G. |
分类号 |
G03F7/20;G03F7/40;G03F7/16;G03F7/32;G03F7/039;G03F7/038 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for creating patterns on a surface of a substrate, comprising
depositing a polymer brush onto the surface of the substrate; depositing a resist layer; forming grating patterns onto the resists; developing the grating patterns; etching to transfer the grating pattern to the polymer brush; and depositing a block copolymer film onto to the substrate; |
地址 |
Upton NY US |