发明名称 Lithographic Patterning
摘要 This disclosure provides embodiments of an approach that enforces coexistence of multiple, aligned block copolymer morphologies within a single patterning layer.
申请公布号 US2017108778(A1) 申请公布日期 2017.04.20
申请号 US201615269202 申请日期 2016.09.19
申请人 Brookhaven Science Associates, LLC 发明人 Black Charles Thomas;Stein Aaron;Wright Gwen;Yager Kevin G.
分类号 G03F7/20;G03F7/40;G03F7/16;G03F7/32;G03F7/039;G03F7/038 主分类号 G03F7/20
代理机构 代理人
主权项 1. A method for creating patterns on a surface of a substrate, comprising depositing a polymer brush onto the surface of the substrate; depositing a resist layer; forming grating patterns onto the resists; developing the grating patterns; etching to transfer the grating pattern to the polymer brush; and depositing a block copolymer film onto to the substrate;
地址 Upton NY US