DEVICE FOR DEPOSITING NANOTUBES

摘要

A device is provided for depositing carbonaceous structures, for example layers in the form of nanotubes or graphene on a substrate, which is supported by a substrate support disposed in a process chamber housing. A process gas can be delivered onto the substrate through gas outlet openings of a gas inlet element disposed in the process chamber housing. The process chamber housing has two opposing walls which each have holding recesses. At least one plate-shaped component is disposed in the process chamber housing. The plate-shaped component has two edge portions directed away from one another that each are inserted respectively in the holding recess of one of the two opposing walls.

主权项

1. A device for depositing structures containing carbon on a substrate (6) which is carried by a substrate carrier (1) which extends in a first plane and which is disposed in a processing-chamber housing (19), wherein the processing-chamber housing (19) has a construction which is symmetrically folded in relation to the first plane, wherein the substrate carrier (1) is a planar body which extends in the first plane, wherein each broadside face (2, 3) of the substrate carrier (1) is configured to carry one substrate, wherein each of the two broadside faces (2, 3) of the substrate carrier (1) lies opposite to a gas-inlet plate (24), having gas-outlet openings (39), of a gas-inlet element (24, 25), wherein a process gas is delivered through the gas-outlet openings (39) towards the substrate (6), wherein the processing-chamber housing (19) has at least a first wall (48) having a cavity (28), and wherein the cavity (28) by means of gas-infeed openings (40) is connected to a gas volume of the gas-inlet element (24, 25) that is disposed adjacent to the gas-inlet plate (24).