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1. A resist composition comprising a base polymer and a sulfonium or iodonium salt having the formula (A):wherein the circle RA is a C3-C12 cyclic hydrocarbon group which may contain an ether, ester, thiol, sulfone moiety or double bond and may be a bridged ring, or a C6-C10 aryl group,
R1 is hydrogen or a straight, branched or cyclic C1-C6 alkyl group, m is an integer of 0 to 5, R2 is selected from the group consisting of hydrogen, straight, branched or cyclic C1-C6 alkyl, acetyl, methoxycarbonyl, ethoxycarbonyl, n-propyloxycarbonyl, isopropyloxycarbonyl, t-butoxycarbonyl, t-pentyloxycarbonyl, methylcyclopentyloxycarbonyl, ethylcyclopentyloxycarbonyl, methylcyclohexyloxycarbonyl, ethylcyclohexyloxycarbonyl, 9-fluorenylmethyloxycarbonyl, allyloxycarbonyl, phenyl, benzyl, naphthyl, naphthylmethyl, methoxymethyl, ethoxymethyl, propoxymethyl, and butoxymethyl, R3 is a straight, branched or cyclic C1-C24 alkylene group which may contain a hydroxyl, alkoxy, ether, ester, sulfonic acid ester, cyano moiety, halogen atom, double bond, triple bond or aromatic moiety, A+ is a sulfonium cation having the formula (B) or iodonium cation having the formula (C):wherein R4, R5 and R6 are each independently a straight, branched or cyclic C1-C12 alkyl or oxoalkyl group, a straight, branched or cyclic C2-C12 alkenyl or oxoalkenyl group, C6-C20 aryl group, or C7-C12 aralkyl or aryloxoalkyl group, in which at least one hydrogen may be substituted by a substituent containing an ether, ester, carbonyl, carbonate, hydroxyl, carboxyl, halogen, cyano, amide, nitro, sultone, sulfonic acid ester, sulfone, thiol moiety or sulfonium salt, or R4 and R5 may bond together to form a ring with the sulfur atom to which they are attached,
R7 and R8 are each independently a C6-C20 aryl group in which at least one hydrogen may be substituted by a straight, branched or cyclic C1-C10 alkyl or alkoxy moiety. |
