PARTICLE MEASURING APPARATUS

摘要

A particle measuring apparatus includes a flow cell configured to flow a specimen, a first light source configured to emit light having a first wavelength, and a second light source configured to emit light having a second wavelength different from the first wavelength. An irradiation optical system is configured to irradiate the flow cell with light emitted from the first light source and the second light source. The irradiation optical system includes a dichroic mirror configured to transmit the light emitted from the first light source and reflect the light emitted from the second light source, and a light collecting lens configured to collect the light emitted from the first and second light sources and passed through the dichroic mirror at the flow cell. The second light source and the dichroic mirror are turnable about rotation axis that are orthogonal to one another.

主权项

1. A particle measuring apparatus comprising:
a flow cell configured to flow a specimen; a first light source configured to emit light having a first wavelength; a second light source configured to emit light having a second wavelength different from the first wavelength; an irradiation optical system configured to irradiate the flow cell with light emitted from the first light source and the second light source, the irradiation optical system including:
a dichroic mirror configured to transmit the light emitted from the first light source and reflect the light emitted from the second light source, anda light collecting lens configured to collect the light emitted from the first and second light sources and passed through the dichroic mirror at the flow cell, wherein the second light source and the dichroic mirror are turnable about rotation axis that are orthogonal to one another.