| 发明名称 |
BLOCK COPOLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME |
| 摘要 |
A block copolymer includes a first polymer block and a second polymer block having different structures, and one of the first polymer block and the second polymer block has a halogen-substituted structure. |
| 申请公布号 |
US2017107317(A1) |
申请公布日期 |
2017.04.20 |
| 申请号 |
US201615225201 |
申请日期 |
2016.08.01 |
| 申请人 |
Samsung Electronics Co., Ltd. |
发明人 |
KWON SEUNGCHUL;PARK Jeongju;YI Shi-yong;KIM Eun Sung;LEE Kyeongmi;BANG Joona;WOO Sanghoon |
| 分类号 |
C08F293/00;H01L21/027 |
主分类号 |
C08F293/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A block copolymer comprising:
a first polymer block and a second polymer block having different structures, one of the first polymer block and the second polymer block having a halogen-substituted structure. |
| 地址 |
Suwon-si KR |
