Substrate table, immersion lithographic apparatus and device manufacturing method

摘要

A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

主权项

1. A substrate table for an immersion lithographic apparatus, the substrate table comprising:
a recess, configured to receive a substrate with an edge having a positioning feature that comprises a notch or flat defining an indent of the substrate, the recess having a support region to support a lower surface of the substrate and an edge configured to be adjacent the edge of the substrate when it is supported by the support region; and an orifice in a surface of the substrate table and configured for the passage of fluid therethrough, the orifice arranged such that, when the substrate is received within the recess and a horizontal gap, outward of the edge of the substrate, is provided between the edge of the substrate and the edge of the recess, the orifice is aligned with the positioning feature of the substrate and is at least partly located underneath a portion of the gap due to the indent of the notch or flat.