Trench isolation structure having isolating trench elements

摘要

A semiconductor device includes a semiconductor substrate, an element isolating trench structure that includes an element isolating trench formed in one main surface of the semiconductor substrate, an insulating material that is formed within the element isolating trench, element formation regions that are surrounded by the element isolating trench, and semiconductor elements that are respectively formed in the element formation regions. The element isolating trench includes first element isolating trenches extending in a first direction, second element isolating trenches extending in a second direction that are at a right angle to the first direction, and third element isolating trenches extending in a third direction inclined at an angle θ (0°<θ<90°) from the first direction.

主权项

1. A semiconductor device comprising a semiconductor substrate, the semiconductor substrate comprising in one main surface of the semiconductor substrate:
an element isolating trench; and a semiconductor element that is formed in an element formation region, wherein the element isolating trench has (i) a first side that connects a first point and a second point, (ii) a second side that connects the first point and a third point, and that forms an angle “90°−θ” (0°<θ<90°) with the first side, (iii) a third side that faces the first side across the element isolating trench, and that runs parallel to the first side, (iv) a fourth side that faces the third side across the element formation region, and that runs parallel to the third side, and (v) a fifth side that is disposed on a first line that extends at a right angle with respect to the first side, and that connects a fourth point that is an end point of the third side and a fifth point that is an end point of the fourth side.