| 发明名称 | Thin film forming apparatus and thin film forming method using the same | ||
| 摘要 | A thin film forming apparatus includes: a thin film source including a thin film on one surface of the thin film source to be transferred to a substrate; and a light emitter configured to apply light energy to the thin film source to transfer the thin film to the substrate. | ||
| 申请公布号 | US9627619(B2) | 申请公布日期 | 2017.04.18 |
| 申请号 | US201514605965 | 申请日期 | 2015.01.26 |
| 申请人 | Samsung Display Co., Ltd. | 发明人 | Lee Duckjung;Choung Jiyoung;Hwang Kyuhwan |
| 分类号 | H01L21/00;H01L51/00;C23C14/04;C23C14/28;H01L51/50 | 主分类号 | H01L21/00 |
| 代理机构 | Lewis Roca Rothgerber Christie LLP | 代理人 | Lewis Roca Rothgerber Christie LLP |
| 主权项 | 1. A method of forming a thin film, the method comprising: arranging a thin film source to face a substrate, the thin film source comprising a thin film on one surface of the thin film source; arranging a mask between the thin film source and the substrate; and transferring the thin film through an opening of the mask to the substrate by applying light energy to the thin film source. | ||
| 地址 | Yongin-si KR | ||