发明名称 On-chip capacitors and methods of assembling same
摘要 An on-chip capacitor a semiconductive substrate is fabricated in a passivation layer that is above the back-end metallization. At least three electrodes are configured in the on-chip capacitor and power and ground vias couple at least two of the at least three electrodes. The first via has a first-coupled configuration to at least one of the first- second- and third electrodes and the second via has a second-coupled configuration to at least one of the first- second- and third electrodes.
申请公布号 US9627312(B2) 申请公布日期 2017.04.18
申请号 US201113995525 申请日期 2011.10.01
申请人 Intel Corporation 发明人 Childs Michael A.;Fischer Kevin J.;Natarajan Sanjay S.
分类号 H01L23/522;H01L49/02 主分类号 H01L23/522
代理机构 Trop, Pruner & Hu, P.C. 代理人 Trop, Pruner & Hu, P.C.
主权项 1. An on-chip capacitor, comprising: a semiconductive substrate including an active surface and a backside surface; a back-end metallization disposed upon the active surface; a passivation structure disposed upon the back-end metallization, wherein the passivation structure includes: at least first, second, and third electrodes that are parallel planar;capacitor first and second dielectric layers between the first and third electrodes;fourth and fifth electrodes;a first via; anda second via; wherein (a) the capacitor first dielectric layer and the capacitor second dielectric layer have the same qualitative chemistries, (b) the first via contacts and penetrates the first electrode and the second via contacts and penetrates the third electrode, (c) the fourth electrode is coplanar with the first electrode and is contacted by the second via, (d) the second electrode is a floater, (e) the fifth electrode is coplanar with the third electrode and contacted by the first via, and (f) the second electrode is above the first electrode and below the third electrode.
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