发明名称 Methods for probing semiconductor fins through four-point probe and determining carrier concentrations
摘要 A method includes probing at least one semiconductor fin using a four-point probe head, with four probe pins of the four-point probe head contacting the at least one semiconductor fin. A resistance of the at least one semiconductor fin is calculated. A carrier concentration of the semiconductor fin is calculated from the resistance.
申请公布号 US9627280(B2) 申请公布日期 2017.04.18
申请号 US201615162320 申请日期 2016.05.23
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Wann Clement Hsingjen;Okuno Yasutoshi;Yeh Ling-Yen;Shih Chi-Yuan;Shao Yuan-Fu;Tsai Wei-Chun
分类号 H01L21/66;H01L21/306;H01L29/06;H01L29/161;H01L29/66 主分类号 H01L21/66
代理机构 Slater Matsil, LLP 代理人 Slater Matsil, LLP
主权项 1. A method comprising: forming a semiconductor region between two opposite portions of an isolation region; performing a planarization to level a top surface of the semiconductor region with top surfaces of the opposite portions of the isolation region; recessing top surfaces of the isolation region, wherein a top portion of the semiconductor region protrudes higher than a top surface of a remaining portion of the isolation region to form a semiconductor fin; probing the semiconductor region using a four-point probe head, wherein four pins of the four-point probe head are in contact with different portions of a top surface of the semiconductor fin; and determining a carrier concentration of the semiconductor region based on results of the probing.
地址 Hsin-Chu TW