发明名称 Electronic device and method for fabricating the same
摘要 An electronic device comprising a semiconductor memory unit that includes a resistance variable element formed over a substrate, and including stacked therein a bottom electrode, a variable resistance layer and a top electrode, and a barrier layer formed over the resistance variable element, and including an amorphous silicon layer which is doped with at least one kind of impurity.
申请公布号 US9627616(B2) 申请公布日期 2017.04.18
申请号 US201414225354 申请日期 2014.03.25
申请人 SK hynix Inc. 发明人 Kim Sook-Joo;Oh Jae-Geun;Lee Keum-Bum;Lee Hyung-Suk
分类号 H01L21/00;H01L45/00;H01L43/12 主分类号 H01L21/00
代理机构 Perkins Coie LLP 代理人 Perkins Coie LLP
主权项 1. A method for fabricating an electronic device, comprising: forming a target processing layer; forming a barrier layer over the target processing layer to include an amorphous silicon layer which is doped with one or more impurities as a mask layer to protect, in subsequent processing, each area of the target processing layer covered by the barrier layer; patterning the barrier layer to form a patterned barrier layer for patterning the target processing layer; and etching the target processing layer using the patterned barrier layer, wherein the target processing layer includes a variable resistance layer that switches between two different resistance states.
地址 Icheon-Si KR