Graded dielectric structures

摘要

Graded dielectric layers and methods of fabricating such dielectric layers provide dielectrics in a variety of electronic structures for use in a wide range of electronic devices and systems. In an embodiment, a dielectric layer is graded with respect to a doping profile across the dielectric layer. In an embodiment, a dielectric layer is graded with respect to a crystalline structure profile across the dielectric layer. In an embodiment, a dielectric layer is formed by atomic layer deposition incorporating sequencing techniques to generate a doped dielectric material.

主权项

1. A device comprising:
a metal oxide doped with a dopant, the metal oxide having a top surface and a bottom surface, wherein the metal oxide has varying amounts of the dopant across the metal oxide between the top and bottom surfaces with concentrations of the dopant at the top surface and at the bottom surface each being greater than a concentration of the dopant in a center of the metal oxide between the top surface and the bottom surface, the dopant including a metal dopant and/or silicon.