EBEAM UNIVERSAL CUTTER

摘要

Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.

主权项

1. A blanker aperture array (BAA) for an e-beam tool, the BAA comprising:
a first column of openings along a first direction; and a second column of openings along the first direction and staggered from the first column of openings, the first and second columns of openings together forming an array having a pitch in the first direction, wherein a scan direction of the BAA is along a second direction, orthogonal to the first direction, and wherein the pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.