| 发明名称 |
ORGANOTIN OXIDE HYDROXIDE PATTERNING COMPOSITIONS, PRECURSORS, AND PATTERNING |
| 摘要 |
Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings. |
| 申请公布号 |
US2017102612(A1) |
申请公布日期 |
2017.04.13 |
| 申请号 |
US201615291738 |
申请日期 |
2016.10.12 |
| 申请人 |
Inpria Corporation |
发明人 |
Meyers Stephen T.;Anderson Jeremy T.;Cardineau Brian J.;Edson Joseph Burton;Jiang Kai;Keszler Douglas A.;Telecky Alan J. |
| 分类号 |
G03F7/004;C09D7/12;G03F7/40;G03F7/32;G03F7/20;G03F7/16 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A coating solution comprising:
an organic solvent; a first organometallic composition represented by the formula RzSnO(2-(z/2)-(x/2))(OH)x where 0<z≦2 and 0<(z+x)≦4, by the formula R′nSnX4-n where n=1 or 2, or a mixture thereof, wherein R and R′ are independently hydrocarbyl groups with 1-31 carbon atoms, and X is a ligand with a hydrolysable bond to Sn or a combination thereof; and a hydrolysable metal compound represented by the formula MX′v, where M is a metal chosen from groups 2-16 of the periodic table of elements, v=a number from 2 to 6, and X′ is a ligand with a hydrolysable M-X bond or combination thereof. |
| 地址 |
Corvallis OR US |
