发明名称 Semiconductor device and method for manufacturing the same
摘要 According to one embodiment, a semiconductor device includes a stacked body and a pillar. The stacked body includes insulating films, electrode films, and silicon containing films. Each of the insulating films and each of the electrode films are stacked alternately. One of the silicon containing films is provided between one of the insulating films and one of the electrode films. The pillar extends in the stacked body in a stacking direction of the insulating films and the electrode films. The pillar includes a silicon pillar and a memory film. The silicon pillar extends in the stacking direction. The memory film is provided between the silicon pillar and one of the electrode films.
申请公布号 US2017104003(A1) 申请公布日期 2017.04.13
申请号 US201615530150 申请日期 2016.12.08
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 MASUDA Hideaki;SHIBA Katsuyasu;YAMADA Nobuhide
分类号 H01L27/11582;H01L21/28;H01L21/311;H01L21/02 主分类号 H01L27/11582
代理机构 代理人
主权项
地址 Minato-ku JP