发明名称 Reactive depletion of reactor deposits in harvesting polycrystalline silicon rods
摘要 The Siemens process for deposition of polycrystalline silicon in the form of rods in a sealed reactor is improved by, after introduction of deposition gas has ceased, introducing a ventilating gas into the partially sealed reactor, withdrawing a gas stream from the reactor, and monitoring the components in the gas stream withdrawn until a desired concentration of one or more components is reached, and opening the reactor to remove the rods.
申请公布号 US9620359(B2) 申请公布日期 2017.04.11
申请号 US201414761523 申请日期 2014.01.13
申请人 Wacker Chemie AG 发明人 Mueller Barbara;Koch Thomas
分类号 C01B33/035;H01L21/02 主分类号 C01B33/035
代理机构 Brooks Kushman P.C. 代理人 Brooks Kushman P.C.
主权项 1. A process for depositing polycrystalline silicon, comprising introducing a reaction gas comprising a silicon-containing component and hydrogen into a reactor positioned on a base plate, as a result of which polycrystalline silicon is deposited in the form of rods, wherein the reactor, after the deposition has ended, is partially opened and ventilated for a particular period prior to full opening and removal of the rods, wherein moistened nitrogen and/or air is introduced into the reactor as a medium for ventilating.
地址 Munich DE