发明名称 Process for synthesizing reduced graphene oxide on a substrate from seedlac
摘要 The present invention relates to synthesizing reduced graphene oxide on the surface of a metal sheet and glass. The invention particularly relates to a process for coating a substrate with reduced graphene oxide using seedlac as a carbon source. As per the process of the current invention, a solution of seedlac is prepared in an alcohol and the substrate is dipped in to the solution for one or more time. The substrate is then dried in air for 1-10 minutes and thereafter, heated to a temperature range of 400 to 1200° C. under controlled atmosphere of Ar/N2/Ar—H2/N2—H2 at a different flow rate ranging from 100 to 500 seem for a period of 10 to 120 minutes.
申请公布号 US9617159(B2) 申请公布日期 2017.04.11
申请号 US201414767959 申请日期 2014.05.08
申请人 Council of Scientific and Industrial Research;Tata Steel Limited 发明人 Shyam Kumar Choudhary;Manish Kumar Bhadu;Tapan Kumar Rout;Sumitesh Das;Ranjan Kumar Sahu;Yashabanta Narayan Singhbabu;Ashit Kumar Pramanick;Vikas Chandra Srivastava
分类号 B05D3/04;C01B31/04;C09D193/00;B05D7/14;B05D7/00;C03C17/32;B82Y40/00 主分类号 B05D3/04
代理机构 The Webb Law Firm 代理人 The Webb Law Firm
主权项 1. A process for synthesizing reduced graphene oxide from seedlac on a substrate, the process comprising: preparing a seedlac solution in a C2-C4 alcohol; dipping the substrate into the seedlac solution one or more times; and heating the substrate in the temperature range of 400° C. to 1200° C. under a controlled atmosphere of Ar, N2, Ar—H2, and/or N2—H2 at the flow rate of 100 to 500 sccm for a period of 10 to 120 minutes.
地址 New Delhi IN