发明名称 Vapor deposition apparatus
摘要 A vapor deposition apparatus including a first region including a first injection unit configured to inject a first raw material, and a second region including a second injection unit configured to inject a second raw material, wherein the second injection unit includes a plasma generation unit, wherein the plasma generation unit includes a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space between the plasma generator and the corresponding surface, and wherein the plasma generator has a groove in a lengthwise direction of the plasma generator.
申请公布号 US9617635(B2) 申请公布日期 2017.04.11
申请号 US201313843801 申请日期 2013.03.15
申请人 Samsung Display Co., Ltd. 发明人 Jang Cheol;Kim Seung-Hun;Song Seung-Yong;Kim Jin-Kwang
分类号 C23C16/50;C23C16/452;C23C16/455;C23C16/54;H01J37/32 主分类号 C23C16/50
代理机构 Lewis Roca Rothgerber Christie LLP 代理人 Lewis Roca Rothgerber Christie LLP
主权项 1. A vapor deposition apparatus comprising: a first region comprising a first injection unit configured to inject a first raw material; and a second region comprising a second injection unit configured to inject a second raw material, wherein the second injection unit comprises a plasma generation unit, wherein the plasma generation unit comprises: a plasma generator comprising: a core unit in a center of the plasma generator; andan outer circumferential unit at least partially surrounding the core unit;a corresponding surface surrounding the plasma generator; anda plasma generation space between the plasma generator and the corresponding surface, and wherein the plasma generator has a groove formed in the outer circumferential unit and extended into the core unit in a lengthwise direction of the plasma generator to expose an inner portion of the core unit.
地址 Yongin-si KR