发明名称 |
Vapor deposition apparatus |
摘要 |
A vapor deposition apparatus including a first region including a first injection unit configured to inject a first raw material, and a second region including a second injection unit configured to inject a second raw material, wherein the second injection unit includes a plasma generation unit, wherein the plasma generation unit includes a plasma generator, a corresponding surface surrounding the plasma generator, and a plasma generation space between the plasma generator and the corresponding surface, and wherein the plasma generator has a groove in a lengthwise direction of the plasma generator. |
申请公布号 |
US9617635(B2) |
申请公布日期 |
2017.04.11 |
申请号 |
US201313843801 |
申请日期 |
2013.03.15 |
申请人 |
Samsung Display Co., Ltd. |
发明人 |
Jang Cheol;Kim Seung-Hun;Song Seung-Yong;Kim Jin-Kwang |
分类号 |
C23C16/50;C23C16/452;C23C16/455;C23C16/54;H01J37/32 |
主分类号 |
C23C16/50 |
代理机构 |
Lewis Roca Rothgerber Christie LLP |
代理人 |
Lewis Roca Rothgerber Christie LLP |
主权项 |
1. A vapor deposition apparatus comprising:
a first region comprising a first injection unit configured to inject a first raw material; and a second region comprising a second injection unit configured to inject a second raw material, wherein the second injection unit comprises a plasma generation unit, wherein the plasma generation unit comprises:
a plasma generator comprising:
a core unit in a center of the plasma generator; andan outer circumferential unit at least partially surrounding the core unit;a corresponding surface surrounding the plasma generator; anda plasma generation space between the plasma generator and the corresponding surface, and wherein the plasma generator has a groove formed in the outer circumferential unit and extended into the core unit in a lengthwise direction of the plasma generator to expose an inner portion of the core unit. |
地址 |
Yongin-si KR |