发明名称 |
Au-containing layer for charged particle beam processing |
摘要 |
The invention provides a method for providing an Au-containing layer onto a surface of a work piece, which method comprises:
providing 510 a deposition fluid comprising Au(CO)Cl;depositing 520 the fluid on at least part of the surface of the work piece; anddirecting 530 a charged particle beam toward the surface of the work piece onto which at least part of the fluid is deposited to decompose Au(CO)Cl thereby forming the Au-containing layer on the surface of the work piece.;By using Au(CO)Cl as a precursor for charged particle induced deposition, a gold Au layer may be deposited with a very high purity compared to methods known in the art. |
申请公布号 |
US9617641(B2) |
申请公布日期 |
2017.04.11 |
申请号 |
US201012814283 |
申请日期 |
2010.06.11 |
申请人 |
FEI Company |
发明人 |
Mulders Johannes Jacobus Lambertus |
分类号 |
C23C18/14;C23C18/08 |
主分类号 |
C23C18/14 |
代理机构 |
Scheinberg & Associates, P.C. |
代理人 |
Scheinberg & Associates, P.C. ;Scheinberg Michael O.;Hillert John E. |
主权项 |
1. A method for providing an Au-containing layer onto a surface of a work piece, the method comprising:
providing a deposition fluid comprising Au(CO)Cl; adsorbing the deposition fluid on at least part of the surface of the work piece; and directing a charged particle beam toward the surface of the work piece onto which at least part of the deposition fluid is deposited to decompose Au(CO)Cl, thereby forming the Au-containing layer on the surface of the work piece. |
地址 |
Hillsboro OR US |